RF PLASMA SOURCES

RF PLASMA SOURCES are used in many applications to produce low energy beams of atomic nitrogen, oxygen, and hydrogen. VESCO-NM RF plasma sources can also be used for doping and semiconductor processing and wafer cleaning applications. Our RF plasma sources demonstrate high dissociation efficiencies enabling growth of high quality MBE nitrides and oxides for electronic and optoelectronic applications. We manufacture RF plasma sources for all gases; Nitrogen, Oxygen, and Hydrogen, as well as deflection plates RF plasma sources. We also make reliable and stable RF matching unit.

Key Features:

• Compatible with all MBE and processing machines
• Plasma strikes at low power
• Very stable plasma modes
• Long-time continuous operation
• No brazing between gas injection tube and plasma chamber
• Easy to operate and to install
• Replaceable crucibles and inserts
• Unique design for plasma chamber and insert
• Interchangeable aperture disks for different applications
• Competitive prices

Specifications:

• Plasma sources for Nitrogen, Hydrogen, and Oxygen
• PBN crucibles for Nitrogen and Hydrogen 
• Quartz crucible for Oxygen
• Mounting flange: 4.5” (other as required)
• In-Vacuum length: 12.5” (other as required)
• Outside length: 8.625”
• In-vacuum tube diameter: 2.250”
• Optional: Deflection plates