VESCO-Ultima 310 MBE SYSTEM
MBE system for 3-4 inch samples with 10 ports for combination of 10 sources and effusion cells. This system is exceptionally versatile with high functionality suitable as a research and production tool for III/V, II/VI, and other materials. The VESCO-ULTIMA 310 is the state-of-the-art MBE system which enables growth for many applications with fully automated wafer transfer options.

Exceptional Quality Through Advanced Manufacturing
- Wafer size 2-4 inches with face down geometry
- Wide range of 10 sources options (valved crackers, plasma source, and effusion cells)
- Substrate heater up to 1200°C
- In-situ characterization capabilities (RHEED, QMS, flux monitor, pyrometer, and Ellipsometry)
- High capabilities for growing different materials in one chamber
- View ports with integrated heaters, LED, and Cameras
- Easy to move, operate, and install (three vacuum chambers on two separate carts)
- Small footprint, space, minimum power and utilities consumption
- High reliability and efficacy
- Easy wafer loading, unloading, and transfer
- Automatic or manual operation
- Separate and movable flux monitor
- Full electronic cabinet
- Well-organized wires and cables
- Competitive price
- Efficient UHV pumping stations with base pressure less than 5 x 10-11 mbar
- Optimized growth geometry to achieve long growth campaigns and high layer uniformity
- LN2 cooling shroud
Technical Data
Growth chamber size | 22” OD, 24” height |
---|---|
Buffer chamber size | 28” OD, 10” height |
Load lock chamber size | 6-way 8” cross |
Wafer cassette size | Two cassettes, 8 sample holder each |
Buffer chamber capacity | 8 sample holders 36 degrees apart |
Substrate size | 2”-4” |
System pumping stations | Growth chamber: Cryo, ion, and TS pumps Buffer chamber: Ion and TS pumps Load lock: turbo and scroll pumps |
Cooling shroud | LN2 or other cooling liquid |
Substrate heater temperature | Up to 1200 C |
Bakeout temperature | Up to 200 C |
Sources port sizes | 4.5” CF flange |
Types of sources | Effusion cells, valved crackers, RF plasma sources, e-beam sources, sublimation sources, and gas injector sources |
Shutters | Magnetically coupled liner shutters |
In-situ monitoring | Ion gauge, QCM, pyrometer, RHEED, QMA |
Sample transfer | Robot transfer arm with azimuth and z travels |
Service | System installation and acceptance testing |
Training | By MBE experts |